Research Catalog

Rare earth oxide thin films : growth, characterization, and applications / Marco Fanciulli, Giovanna Scarel (eds.).

Title: Rare earth oxide thin films : growth, characterization, and applications / Marco Fanciulli, Giovanna Scarel (eds.).
Publication: Berlin ; New York : Springer, c2007.

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Description

xvi, 426 p. : ill.; 25 cm.

Series Statement

Topics in applied physics, 0303-4216 ; v. 106

Uniform Title

Topics in applied physics v. 106.
Topics in applied physics 106.

Subjects

Genre/Form

Congress
Conference papers and proceedings
Conference papers and proceedings.

Note

"Collects most of the contributions given at the European Exploratory Workshop entitled 'Rare earth oxide thin films: growth, characterization, and applications,' which took place at the Villa Nobel in Sanremo (IM), Italy, from May 11 to May 13, 2005"--P. vii.

Bibliography (note)

Includes bibliographical references and indexes.

Contents

Scientific and technological issues related to rare earth oxides: an introduction / Giovanna Scarel, Axel Svane, Marco Fanciulli -- Atomic layer deposition of rare earth oxides / Jani Paivassari [and others] -- MOCVD growth of rare earth oxides: the case of the praseodymium/oxygen system / Raffaella Lo Nigro [and others] -- Requirements of precursors for MOCVD and ALD of rare earth oxides / Helen C. Aspinall -- Models for ALD and MOCVD growth of rare earth oxides / Simon D. Elliot -- Growth of oxides with complex stoichiometry by the ALD technique, exemplified by growth of La1-xCaxMno3 / Ola Nilsen [and others] -- Molecular beam epitaxy of rare-earth oxides / H. Jorg Osten [and others] -- Fabrication and characterization of rare earth scandate thin films prepared by pulsed laser deposition / Jurgen Schubert, Tassilo Heeg, Martin Wagner -- Film and interface layer composition of rare earth (Lu, Yb) Oxides deposited by ALD / Yuri Lebedinskii [and others] --^
Local atomic environment of high-k oxides on silicon probed by x-ray absorption spectroscopy / Marco Malvestuto, Federico Boscherini -- Local structures, composition and electronic properties of rare earth oxide thin films studied using advanced transmission electron microscopy techniques (TEM-EELS) / Sylvie Schamm, Giovanna Scarel, Marco Fanciulli -- Strain-relief at internal dielectric interfaces in high-k gate stacks with trasition metal and rare earth atom oxide dielctrics / Gerald Lucovsky, James C. Phillips -- Electrical characterization of rare earth oxides grown by atomic layer deposition / Sabina Spiga [and others] -- Dielectric properties of rare-earth oxides: general trends from theory / Pietro Delugas, Vincenzo Fiorentini, Alessio Filppetti -- Charge traps in high-k dielectrics: ab initio study of defects in Pr-based materials / Jarek Dabrowski [and others] --^
Experimental determination of the band of rare earth oxides on various semiconductors / Gabriele Seguini, Michele Perego, Marco Fanciulli -- Band edge electronic structure of transition metal/rare earth oxide dielectrics / Gerald Lucovsky -- Electronic structure and band offset of lanthanide oxides / John Robertson, Ka Xiong -- Electronic structure of rare earth oxides / Leon Petit [and others] -- Rare earth oxides in microelectronics / Kuniyuki Kakushima [and others] -- Requirements of oxides as gate dielectrics for CMOS devices / Gennadi Beruker, Peter Zeitzoff -- Rare earth oxides grown by molecular beam epitaxy for ultimate scaling / Athanasios Dimoulas -- The magneto-electric properties of RMnO3 compounds / Thomas T.M. Palstra -- Sesquioxides as host materials for rare-earth doped bulk lasers and active waveguides / Sebastian Bar [and others].

ISBN

3540357963
9783540357964

LCCN

^^2006935383
9783540357964

OCLC

75927046

Owning Institutions

Harvard Library